Ultralow 0.034 dB/m loss wafer-scale integrated photonics realizing 720 million Q and 380 µW threshold Brillouin lasing

  • Kaikai Liu
  • , Naijun Jin
  • , Haotian Cheng
  • , Nitesh Chauhan
  • , Matthew W. Puckett
  • , Karl D. Nelson
  • , Ryan O. Behunin
  • , Peter T. Rakich
  • , Daniel J. Blumenthal

Research output: Contribution to journalArticlepeer-review

82 Scopus citations

Abstract

We demonstrate 0.034 dB/m loss waveguides in a 200-mm wafer-scale, silicon nitride (Si3N4) CMOS-foundrycompatible integration platform. We fabricate resonators that measure up to a 720 million intrinsic Q resonator at 1615 nm wavelength with a 258 kHz intrinsic linewidth. This resonator is used to realize a Brillouin laser with an energy-efficient 380 µW threshold power. The performance is achieved by reducing scattering losses through a combination of single-mode TM waveguide design and an etched blanket-layer low-pressure chemical vapor deposition (LPCVD) 80 nm Si3N4 waveguide core combined with thermal oxide lower and tetraethoxysilane plasma-enhanced chemical vapor deposition (TEOS–PECVD) upper oxide cladding. This level of performance will enable photon preservation and energy-efficient generation of the spectrally pure light needed for photonic integration of a wide range of future precision scientific applications, including quantum, precision metrology, and optical atomic clocks.

Original languageEnglish (US)
Pages (from-to)1855-1858
Number of pages4
JournalOptics Letters
Volume47
Issue number7
DOIs
StatePublished - Apr 1 2022

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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