A new electron microscopy technique to study topography on thin films is reported. The technique is based on the use of weak diffracted beams. Applications to the characterization of single and polycrystalline films is discussed.
|Original language||English (US)|
|Number of pages||3|
|State||Published - Dec 15 1982|
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Engineering (miscellaneous)
- Electrical and Electronic Engineering