Abstract
A new electron microscopy technique to study topography on thin films is reported. The technique is based on the use of weak diffracted beams. Applications to the characterization of single and polycrystalline films is discussed.
Original language | English (US) |
---|---|
Pages (from-to) | 4465-4467 |
Number of pages | 3 |
Journal | Applied Optics |
Volume | 21 |
Issue number | 24 |
DOIs | |
State | Published - Dec 15 1982 |
Externally published | Yes |
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
- Engineering (miscellaneous)
- Electrical and Electronic Engineering