Technique for the study of surface roughness of thin films

K. Truszkowska, M. Jose-Yacaman

Research output: Contribution to journalArticlepeer-review


A new electron microscopy technique to study topography on thin films is reported. The technique is based on the use of weak diffracted beams. Applications to the characterization of single and polycrystalline films is discussed.

Original languageEnglish (US)
Pages (from-to)4465-4467
Number of pages3
JournalApplied Optics
Issue number24
StatePublished - Dec 15 1982
Externally publishedYes

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics
  • Engineering (miscellaneous)
  • Electrical and Electronic Engineering


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