Shape control in wafer-based aperiodic 3D nanostructures

Hyeon Ho Jeong; Andrew G. Mark; John G. Gibbs; Thomas Reindl; Ulrike Waizmann; Jürgen Weis; Peer Fischer

doi:10.1088/0957-4484/25/23/235302

Shape control in wafer-based aperiodic 3D nanostructures

Hyeon Ho Jeong, Andrew G. Mark, John G. Gibbs, Thomas Reindl, Ulrike Waizmann, Jürgen Weis, Peer Fischer

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

Abstract

Controlled local fabrication of three-dimensional (3D) nanostructures is important to explore and enhance the function of single nanodevices, but is experimentally challenging. We present a scheme based on e-beam lithography (EBL) written seeds, and glancing angle deposition (GLAD) grown structures to create nanoscale objects with defined shapes but in aperiodic arrangements. By using a continuous sacrificial corral surrounding the features of interest we grow isolated 3D nanostructures that have complex cross-sections and sidewall morphology that are surrounded by zones of clean substrate.

Original language	English (US)
Article number	235302
Journal	Nanotechnology
Volume	25
Issue number	23
DOIs	https://doi.org/10.1088/0957-4484/25/23/235302
State	Published - Jun 13 2014
Externally published	Yes

Keywords

3D nanofabrication
electron beam lithography
glancing angle deposition
physical vapour deposition
shadow growth

ASJC Scopus subject areas

Bioengineering
General Chemistry
General Materials Science
Mechanics of Materials
Mechanical Engineering
Electrical and Electronic Engineering

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10.1088/0957-4484/25/23/235302

Cite this

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abstract = "Controlled local fabrication of three-dimensional (3D) nanostructures is important to explore and enhance the function of single nanodevices, but is experimentally challenging. We present a scheme based on e-beam lithography (EBL) written seeds, and glancing angle deposition (GLAD) grown structures to create nanoscale objects with defined shapes but in aperiodic arrangements. By using a continuous sacrificial corral surrounding the features of interest we grow isolated 3D nanostructures that have complex cross-sections and sidewall morphology that are surrounded by zones of clean substrate.",

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AU - Jeong, Hyeon Ho

AU - Mark, Andrew G.

AU - Gibbs, John G.

AU - Reindl, Thomas

AU - Waizmann, Ulrike

AU - Weis, Jürgen

AU - Fischer, Peer

PY - 2014/6/13

Y1 - 2014/6/13

N2 - Controlled local fabrication of three-dimensional (3D) nanostructures is important to explore and enhance the function of single nanodevices, but is experimentally challenging. We present a scheme based on e-beam lithography (EBL) written seeds, and glancing angle deposition (GLAD) grown structures to create nanoscale objects with defined shapes but in aperiodic arrangements. By using a continuous sacrificial corral surrounding the features of interest we grow isolated 3D nanostructures that have complex cross-sections and sidewall morphology that are surrounded by zones of clean substrate.

AB - Controlled local fabrication of three-dimensional (3D) nanostructures is important to explore and enhance the function of single nanodevices, but is experimentally challenging. We present a scheme based on e-beam lithography (EBL) written seeds, and glancing angle deposition (GLAD) grown structures to create nanoscale objects with defined shapes but in aperiodic arrangements. By using a continuous sacrificial corral surrounding the features of interest we grow isolated 3D nanostructures that have complex cross-sections and sidewall morphology that are surrounded by zones of clean substrate.

KW - 3D nanofabrication

KW - electron beam lithography

KW - glancing angle deposition

KW - physical vapour deposition

KW - shadow growth

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VL - 25

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Shape control in wafer-based aperiodic 3D nanostructures

Abstract

Keywords

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