Parallel fabrication of wafer-scale plasmonic metamaterials for nano-optics

S. Eslami, J. G. Gibbs, A. G. Mark, T. C. Lee, H. H. Jeong, I. Kim, P. Fischer

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We describe how physical vapor deposition coupled with micelle-nanolithography-seeded substrates permits the growth of metamaterials with 3D structural and material control at the nanoscale. Novel plasmonic hybrid structures with tuned optical response from the UV to the near IR are demonstrated.

Original languageEnglish (US)
Title of host publicationAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII
EditorsWinston V. Schoenfeld, Georg von Freymann, Raymond C. Rumpf
PublisherSPIE
ISBN (Electronic)9781628414646
DOIs
StatePublished - 2015
Externally publishedYes
EventAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII - San Francisco, United States
Duration: Feb 8 2015Feb 11 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9374
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceAdvanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII
Country/TerritoryUnited States
CitySan Francisco
Period2/8/152/11/15

Keywords

  • chirality
  • metamaterial
  • optical activity
  • plasmonic

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Fingerprint

Dive into the research topics of 'Parallel fabrication of wafer-scale plasmonic metamaterials for nano-optics'. Together they form a unique fingerprint.

Cite this