Abstract
In this work the wavelet transform is used to process electron micrographs and simulated images. It is concluded that the edge sensitivity of the technique and its contrast enhancement capabilities are most useful in the processing of electron micrographs. In particular it is shown that the wavelet transform has some distinctive advantages over conventional Fourier transform filtering when analyzing images from samples that contain boundaries.
Original language | English (US) |
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Pages (from-to) | 319-324 |
Number of pages | 6 |
Journal | Ultramicroscopy |
Volume | 38 |
Issue number | 3-4 |
DOIs | |
State | Published - Dec 1991 |
Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Instrumentation