TY - JOUR
T1 - Growth of aligned ZnO nanorods on transparent electrodes by hybrid methods
AU - Meléndrez, M. F.
AU - Hanks, K.
AU - Leonard-Deepak, Francis
AU - Solis-Pomar, F.
AU - Martinez-Guerra, E.
AU - Pérez-Tijerina, E.
AU - José-Yacaman, M.
N1 - Funding Information:
Acknowledgements The project described was supported by the National Center for Research Resources (Award Number 2G12RR013646-11). The content is solely the responsibility of the authors and does not necessarily represent the official views of the National Center for Research Resources or the National Institutes of Health also to PREM grant number which is DMR 0934218 ‘‘Oxide and Metal Nanoparticles—The Interface Between Life Sciences and Physical Sciences’’. The authors thank to ‘‘Servicios Industriales Penoles, SA de C.V’’ from México, electronic microscopy laboratory of the International Center for Nanotechnology and Advanced Materials at the University of Texas at San Antonio, we also thank Dave Olmos from UTSA for technical support, Paola Jose for her assistance in this study and Department of Material Engineering at the University of Concepcion-Chile.
PY - 2012/2
Y1 - 2012/2
N2 - The fabrication of ZnO (80 nm) thin film was achieved by hybrid atomic layer deposition (ALD) to prevent the reaction between the reactants and conductive layer of the substrates. ZnO nanorods (ZnO-NRs) growth over the substrates was performed by wet chemical procedure in which Zn(NO 3) 2 and hexamethylenetetramine were used as the precursors. HR-TEM, SAED, FE-SEM, X-ray diffraction (XRD), and UV-Vis spectroscopy were employed to characterize the ZnO-NRs samples on the substrates. XRD and HR-TEM analyses confirmed that the ZnO nanorod structure is hexagonal wurtzite type with growth in the [0001] direction. Length and thickness of the ZnO-NRs ranged between 45 and 90 nm and 480 and 600 nm, respectively. It was observed that the growth rate of NRs in [0001] direction is 10 times higher than in [1000] direction. The growth mechanism and resulted dimensions of nanorods are function of the synthesis parameters (in hybrid ALD process) such as reaction time, temperature, precursor molar ratio, and thickness of ZnO film.
AB - The fabrication of ZnO (80 nm) thin film was achieved by hybrid atomic layer deposition (ALD) to prevent the reaction between the reactants and conductive layer of the substrates. ZnO nanorods (ZnO-NRs) growth over the substrates was performed by wet chemical procedure in which Zn(NO 3) 2 and hexamethylenetetramine were used as the precursors. HR-TEM, SAED, FE-SEM, X-ray diffraction (XRD), and UV-Vis spectroscopy were employed to characterize the ZnO-NRs samples on the substrates. XRD and HR-TEM analyses confirmed that the ZnO nanorod structure is hexagonal wurtzite type with growth in the [0001] direction. Length and thickness of the ZnO-NRs ranged between 45 and 90 nm and 480 and 600 nm, respectively. It was observed that the growth rate of NRs in [0001] direction is 10 times higher than in [1000] direction. The growth mechanism and resulted dimensions of nanorods are function of the synthesis parameters (in hybrid ALD process) such as reaction time, temperature, precursor molar ratio, and thickness of ZnO film.
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U2 - 10.1007/s10853-011-6002-x
DO - 10.1007/s10853-011-6002-x
M3 - Article
AN - SCOPUS:84857602526
SN - 0022-2461
VL - 47
SP - 2025
EP - 2032
JO - Journal of Materials Science
JF - Journal of Materials Science
IS - 4
ER -