Extended scalability and functionalities of MRAM based on thermally assisted writing

  • B. Dieny
  • , R. Sousa
  • , S. Bandiera
  • , M. Castro Souza
  • , S. Auffret
  • , B. Rodmacq
  • , J. P. Nozieres
  • , J. Hérault
  • , E. Gapihan
  • , I. L. Prejbeanu
  • , C. Ducruet
  • , C. Portemont
  • , K. Mackay
  • , B. Cambou

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

MRAM are already used in low density applications such as microcontrollers or for spatial/avionics applications where they benefit from their radiation hardness. Thermally assisted writing allows extending the downsize scalability of both FIMS and STT-MRAM below the 20nm node. Within a few years, MRAM can play an important role in the memory hierarchy of electronic circuits. They may be first used as DRAM replacement below the 20nm node and in a second step even closer the logic units (Fig.10).

Original languageEnglish (US)
Title of host publication2011 International Electron Devices Meeting, IEDM 2011
Pages1.3.1-1.3.4
DOIs
StatePublished - 2011
Externally publishedYes
Event2011 IEEE International Electron Devices Meeting, IEDM 2011 - Washington, DC, United States
Duration: Dec 5 2011Dec 7 2011

Publication series

NameTechnical Digest - International Electron Devices Meeting, IEDM
ISSN (Print)0163-1918

Conference

Conference2011 IEEE International Electron Devices Meeting, IEDM 2011
Country/TerritoryUnited States
CityWashington, DC
Period12/5/1112/7/11

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Materials Chemistry
  • Electrical and Electronic Engineering

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