Dopant characterization of fin field-effect transistor structures using scanning capacitance microscopy
- A. A. Khajetoorians
- , J. Li
- , C. K. Shih
- , X. D. Wang
- , D. Garcia-Gutierrez
- , M. Jose-Yacaman
- , D. Pham
- , H. Celio
- , A. Diebold
Research output: Contribution to journal › Article › peer-review
11
Link opens in a new tab
Scopus
citations